The ICCAP Instructions contain the basic procedures for making measurements and performing modeling. This screen is intended to point out things unique to using the mosc_B_344.mdl model file.
The square capacitor is 300 x 300 microns, the round capacitor radius equals 150 microns, and the finger capacitor has a center region of 100 x 100 microns and twelve 20 x 100 microns fingers.
Cox = dielectric constant of oxide * Area / Thickness
Under a particular bias polarity, a depletion layer will form in the silicon below the oxide, adding another capacitor in series with the oxide capacitor. The differential capacitance, Cd, of the semiconductor-space charge region is
Cd = dielectric constant of silicon * Area / Thickness of depletion region
The total capacitance is
Ctot = (Cox * Cd)/(Cox+Cd)
Here is a typical C-V curve for a MOS capacitor on a grounded n-type substrate with v_aluminum applied to an aluminum contact on top of the oxide. The flat regions corresponding to the oxide capacitance and the total capacitance at maximum depletion width are evident.
It is possible to model the capacitors by separating the capacitance
into center and edge effects. The equations are similar to those used
for modeling the
p-n junction capacitance.
The total capacitance per area is
Ctotal = P * Cedge + A * Carea,
where P equals the perimeter and A equals the area. Note that the units of Cedge and Carea are pF/um and pF/um^2, respectively. By using two of the capacitors, it is possible to solve for P and A.