ECE444 uses a five mask process to fabricate a multitude of electronic devices.

Click on an area of the wafer below to learn more about the devices fabricated in the ECE444 lab.

The mask set is currently under revision 1998: Dane Sievers, which is a minor redesign of revision 1994: Ron Stack. All revisions are based on the work of revision 1991: Kevin Tsurutome.