The ece444 mask set contains approximately 19,000 structures
on a 100mm Si wafer.
Approximately 10,000 are electronic devices and ~9,000
are test patterns.
Examples of the devices fabricated:
- PMOSFETs
- NMOSFETs
- MOS Capacitors
- pn Diodes
- BJTs
- Resistors
The current mask set is based on the work of Kevin Tsurutome (1991), Ron Stack (1994), and Dane
Sievers (1998).
LASI was used for the layout of
the mask and printed using the e-beam lithography system located in the
Micro and Nanotechnology Lab.
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