The ece444 mask set contains approximately 19,000 structures on a 100mm Si wafer.

Approximately 10,000 are electronic devices and ~9,000 are test patterns.

Examples of the devices fabricated:

• PMOSFETs
• NMOSFETs
• MOS Capacitors
• pn Diodes
• BJTs
• Resistors

The current mask set is based on the work of Kevin Tsurutome (1991), Ron Stack (1994), and Dane Sievers (1998).

LASI was used for the layout of the mask and printed using the e-beam lithography system located in the Micro and Nanotechnology Lab.